Used NANOMETRICS Nano 215S #9226644 for sale

NANOMETRICS Nano 215S is a high performance mask and wafer inspection equipment that uses three-dimensional (3D) imaging technology. It is designed for semiconductor IC device production processes and features multiple sample view cameras and a powerful LED light source which allows for precise high-speed 3D imaging of the defect and characterization. Nano 215S also includes a high-speed external vision system that is capable of capturing and analyzing large defect sizes. This mask and wafer inspection technique is highly reliable and provides detailed three-dimensional imaging of defects with 1 meter resolution. This allows for higher levels of accuracy and repeatability when inspecting mask and wafer defects. Its integrated defect validation and pre-analysis software improve time to insight while its intuitive user interface enhances workflow. In addition to precision 3D imaging, NANOMETRICS Nano 215S also features a wide field of view (FOV) camera that allows for a greater coverage area to observe and quickly detect defects larger than 1 millimeter. Nano 215S also features a multiple wavelength detection unit that increases sampling speed and accuracy. Other features include an asynchronous observation machine that allows multiple data streams to be captured simultaneously, along with an autofocus tool that provides adaptive focus on different information. NANOMETRICS Nano 215S offers both wafer and mask CD-SEM performance. It is capable of characterizing and measuring the size of various defects on different materials. It provides real-time analysis and detection of these different defects, with both optical and scanning electron microscopy (SEM) strategies that are used for on-the-fly analysis. Nano 215S has automated wafer operation tools and auto-sampling functions that allow uniform wafer sampling and processing. The asset is customizable to match the applications specific to its use and can be interfaced with 3rd party machines for a connected workflow. Its high-speed imaging enables increased throughput for faster execution of scanning and analysis tasks. NANOMETRICS Nano 215S is a cost-effective and high-performance mask and wafer inspection model that delivers faster defect detection and characterization with higher precision. Its powerful 3D imaging capabilities combined with a wide FOV camera and multiple wavelength detection equipment improves the accuracy and repeatability of defective analysis so that users can quickly determine and repair issues accurately and efficiently.