Used NANOMETRICS Nano 215S #9250105 for sale

NANOMETRICS Nano 215S is a highly advanced mask and wafer inspection equipment that allows for accurate and reliable high-resolution imaging. Through superior image quality, sophisticated automated inspection, and intuitive operator interface, this system helps increase yield and reduce defects for a wide range of semiconductor device applications. Generally, this mask and wafer inspection unit works by capturing a digital image of the sample and then carrying out automated inspection to identify any patterns or anomalies in the image. Its modular design provides a platform for a range of imaging and inspection capabilities, including brightfield microscopy, darkfield microscopy, laser micrometry, SEM, infrared and more. It also incorporates a variety of techniques, such as AI-based pattern matching, image comparison, signal-to-noise analysis, and defect categorization. The main feature of Nano 215S is its advanced sensors, imaging optics, and software. The resolution is up to 0.4 µm— one of the highest in the industry. The sensors, including CCD and sCMOS, can capture up to 5 megapixel images with high dynamic range and sensitivity. The optics and microscope offer video imaging from brightfield and darkfield modes to 3D imaging with laser micrometry. The software of the machine is both visually intuitive and user-friendly. It offers a wide range of automated inspection features, helping to identify alignment patterns, defects, dimensional deviations, material variations, and more. AI-based algorithms enable defect categorization and reporting, as well as complex pattern recognition of custom know how and features. The user-friendly GUI helps users quickly and easily configure inspections for various operations. Overall, NANOMETRICS Nano 215S is a highly advanced mask and wafer inspection tool that offers superior image quality, sophisticated automated inspection, and intuitive user interface. Its modular design and advanced imaging and inspection capabilities help increase yield and reduce defects, adding value to the semiconductor device testing process.