Used NANOMETRICS NANOLINE 50-2/50-2C #9101475 for sale

NANOMETRICS NanoLine 50-2 and 50-2C are high-performance automated mask and wafer inspection systems. They are designed for 200mm wafers with up to a 2000 mm × 2000 mm array size. The equipment can inspect the wafer, with a high-resolution CCD camera, for pattern defects, particle contamination and photoresist material.. The system is capable of producing complete full chip images in a short amount of time. The images are created by diffusion-limited parfocal objectives or a proprietary wide step pattern and are provided on a high-resolution, large-format charge-coupled device (CCD) camera and laser line projection unit. The machine also offers an advanced StereoDetection algorithm which can detect small details, aggressive defects and spanning defects in the most challenging metrology challenges. The NanoLine 50-2 and 50-2C feature an integrated image-processing tool that is capable of extracting fine pattern details from the wafer, as well as providing automated defect classification and output reports. The asset is capable of viewing both near-infrared (NIR) and optical imaging. Furthermore, it can also be configured with a 3D capability that allows for the inspection of low-topography areas. The NanoLine 50-2/50-2C is designed to provide high repeatability and long-term accuracy. It utilizes a fast re-positioning model with an incremental accelerometer and dynamic balance equipment to ensure accurate image alignment over time. The machine can operate with three-roller independent axes, scanning at up to 2000 mm × 2000 mm/sec. The components of the system are constructed of rigid, non-flexing, and easily maintainable materials to ensure the highest quality images and performance. The unit is also calibrated by a proprietary NANOMETRICS algorithm which is capable of compensating variations in the camera sensor, lens, and illumination. The machine is controlled by a powerful, easy to use graphical user interface (GUI). The GUI is fully customizable and has features such as advanced tool automation and reporting capabilities. It is also compatible with the most commonly used EDA or CAD software, making integration into the process flow easy. NANOMETRICS NanoLine 50-2 and 50-2C are designed to ensure the highest-quality results for metrology applications. High-resolution images, accurate defect detection, and repeatable performance make them the ideal choice for applications such as semiconductor defect detection, optical lithography and photovoltaic panel inspection. The advanced features and intuitive GUI of the tool make them perfect for both high volume production and research environments.