Used NANOMETRICS NANOLINE 50-2 #9193170 for sale

NANOMETRICS NANOLINE 50-2 is an automated, high speed, Mask & Wafer Inspection equipment designed to detect and analyze a wide variety of critical defects with very high accuracy. The system utilizes a wafer carrying stage equipped with direct drive and high resolution non-contact linear encoders for ultra-precise movement and alignment of the wafer within the stage. The precision of the stage is further enhanced with a motorized theta stage for accurate positioning of the wafer. Additionally, an objective with variable numerical aperture allows the unit to provide high resolution imaging for small pitch patterns. The machine is capable of full field inspection of every quadrant of the wafer as well as automatic calibration using standard calibration slips or wedges. In addition to calibration, NANOLINE 50-2 provides comprehensive measure and alignment features to ensure accurate measurements. For defect analysis and characterization, the tool comes with an advanced Method Editor Software that supports many types of imaging analysis techniques such as brightfield, darkfield, phase imaging, APS, CWF, and Coloumns. For defect detection, threshold and pixel measurements are provided, and the asset has line pattern matching capabilities given that the patterns are stored in a database. Additionally, a multi-region histogram-based instrument is included that can detect pattern deviations that are below the microscope resolution. To support further defect inspection, the model has a built-in strobed LED lighting equipment that can provide variable illumination levels, enabling users to achieve higher contrast. A wide array of defect types such as printing defects, etch defects, and particle defects can be detected. The system also comes with an embedded high-performance PC and a large 21" touchscreen display for easy operation of the interface. Additionally, the PC provides network connectivity to external databases and devices, providing sophisticated data analysis and workflow control. In summary, NANOMETRICS NANOLINE 50-2 Mask & Wafer Inspection Unit is an automated and high-performance machine designed to provide reliable detection and analysis of a wide range of defects on wafers. The tool is very accurate and provides a variety of features for calibration, defect detection, and characterisation. The integrated PC and large touchscreen display makes it ideal for easy user operation, and the strobed LED lighting and tilt-able objectives allow detailed analysis of defects using a variety of imaging techniques.