Used NANOMETRICS NANOLINE CD 50 #9166570 for sale

NANOMETRICS NANOLINE CD 50 is a next-generation mask and wafer inspection equipment designed to meet the needs of advanced semiconductor production lines. Developed with the latest advances in optics, sensors, imaging, and automation, the system is capable of delivering fast, reliable, and accurate inspection and metrology for a variety of applications. From the perspective of basic architecture, NANOLINE CD 50 is a fully automated, PC-controlled, and self-contained inspection station equipped with a state-of-the-art Zeiss optical microscope, a Relion microprocessor, and an industrial robot. The industrial grade linear stage enables high precision positioning of wafers, enabling the unit to accurately scan each device. Additionally, the machine is capable of imaging wafers up to 5 inches in diameter and up to four substrates at a time, for a maximum throughput of 40 substrates per hour. The advanced imaging components of the tool ensure high-resolution inspection of devices. The Zeiss microscope is equipped with a field of view of 14mm x 10mm, providing an image with 73 nm of pixel size. An intensified CCD camera simultaneously captures images of wafers with up to 48 million pixels resolution, resulting in extremely high image quality. The image analysis algorithms of NANOMETRICS NANOLINE CD 50 are based on feature recognition, image segmentation and classification, color, and contrast analysis. The asset is also capable of advanced pattern recognition and feature classification, allowing accurate inspection of complex patterns such as vias, contacts, and other nanoscale structures. To improve efficiency, NANOLINE CD 50 can be integrated into larger automated model. In addition, the equipment is able to communicate with other systems or devices, transferring data and results via the internet or other networks. The system is compatible with a variety of operating systems including Windows, Linux, and Mac OS X. Overall, NANOMETRICS NANOLINE CD 50 is a highly advanced and sophisticated mask and wafer inspection unit designed to provide accurate, fast, and reliable inspection and metrology for advanced semiconductor production. From its state-of-the-art Zeiss microscope, to its sophisticated image analysis algorithms, and its compatibility with value chain automation, NANOLINE CD 50 is a superior solution for any application requiring reliable and accurate mask and wafer inspection.