Used NANOMETRICS NanoSpec 181 #63433 for sale

NANOMETRICS NanoSpec 181
ID: 63433
Wafer Size: 3", 4"
Vintage: 1986
Film thickness analyzer Model No.: 7000-0092 Measures (11) film types: silicon dioxide, silicon nitride, negative and positive resists, polysilicon, thin oxides and nitrides, and polyimide on silicon Range: 480 to 800nm CS-2 computer Wafer shuttle stage for 3/4" wafers OLYMPUS objectives: 5x/10x/40x M Plan WYSE terminal Voltage: 110V 1986 vintage.
NANOMETRICS NanoSpec 181 is a mask and wafer inspection equipment designed for a wide range of semiconductor manufacturing applications. It utilizes a proprietary image processing system combined with a range of imaging and optical systems to ensure high-precision imaging at nanoscale resolution. The unit performs optical measurements with accuracy and precision of 1nm (1 nanometer). NanoSpec 181 features a wafer stage and a unique hexapod positioning machine that provides 6-axis motion control and superior stability. This allows for highly precise sample alignment and consistently repeatable accuracy of measurements. The imaging subsystem of NANOMETRICS NanoSpec 181 is based on two-lens optics with long working distance, ideal for 3D imaging. A step and scan technology is used, featuring a high-resolution line scan camera that captures images of the sample while the stage is being moved. The images are then stitched together in real time to build detailed 3D maps. The line scan camera provides high maximum frame rate and dynamic alignment. NanoSpec 181 also features a macro inspection mode. This lets users systematically scan large areas of each wafer at the same level of detail, providing a complete understanding of their surface structures. Several mode operations are available, including defect detection, overlay measurement and whisker detection. NANOMETRICS NanoSpec 181 enables users to quickly and precisely capture necessary data from different layers of a semiconductor device. The resulting images and data can be visualized, stored and subsequently utilized for process optimization and improving device yield. The tool is easy to use and is ideal for demonstrating extremely high levels of accuracy, precision and reproducibility of data. Through the combination of its sophisticated imaging asset, innovative mechanics and intuitive user interface, NanoSpec 181 is an ideal model for delivering accurate, repeatable results in industrial semiconductor manufacturing.
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