Used NANOMETRICS NanoSpec 181 #9077096 for sale

NANOMETRICS NanoSpec 181
ID: 9077096
Film thickness measurement system.
NANOMETRICS NanoSpec 181 is a highly advanced mask and wafer inspection equipment. The system offers a suite of automated, software-driven functions to provide reliable operation, precise inspection and fault-detection capabilities. The 181 also provides real-time analysis of various defects and to perform advanced defect evaluation. This mask & wafer inspection unit uses a combination of a digital video camera, optical microscopy and high resolution imaging technology to detect defects in both wafers and masks. The inspection machine captures images of objects with sub-micron resolutions, making it possible to clearly identify small defects, such as scratches, pockmarks, voids, contact contamination and pinholes. The 181 also supports automated defect detection and classification to maximize operator productivity. NanoSpec 181 utilizes high-speed image processing for rapid and accurate identification of defects. This tool offers a wide range of inspection capabilities, such as wafer leakage test, electrical defect analysis, overlay test, failure analysis and more. The asset is compatible with a variety of software applications, including manual, semi-automated and full-automation modes. The model also has an advanced image acquisition and analysis capabilities that includes a high-resolution imaging equipment (up to 5.5u) and a stereo microscope system (up to 50x). These features make it possible to inspect multiple areas of the wafer or mask at once, as well as to zoom-in on suspected defects. The unit is designed to withstand harsh industrial environments, providing reliable and consistent performance regardless of temperature, vibration or humidity levels. Moreover, NANOMETRICS NanoSpec 181 is equipped with an ergonomic design for improved user comfort and ease-of-use. To summarize, NanoSpec 181 is a feature-rich, high-performance machine offering enhanced accuracy and speed for mask & wafer inspection. Its advanced imaging and analysis capabilities allow for rapid defect detection and failure analysis of wafers and masks. The tool also features a robust and ergonomic design, making it suitable for a wide range of industrial applications.
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