Used NANOMETRICS NanoSpec 181 #9266797 for sale

NANOMETRICS NanoSpec 181 is a mask and wafer inspection equipment designed to provide highly accurate inspection of semiconductor masks and wafers. The system utilizes a Chromatic Overlay Measurement (COM) technology with high accuracy and repeatability to inspect patterns with feature sizes down to 0.2 microns. This makes NanoSpec 181 ideal for processes such as photomasks, lithography, etching, and CMP. NANOMETRICS NanoSpec 181 utilizes a high-resolution 5.1 Megapixel camera and chromatic overlay measurement, allowing for the inspection of 256 shades of gray and 8 dimensions of color. This provides a wide range of visibility into pattern features, including defects. The unit has an automated pattern recognition feature for quick detection of defects, and the ability to zoom in to 1.3nm for detailed analysis of minute features. The machine also includes comprehensive feature analysis capabilities, such as area and length measurements, stringer analysis, and process analysis. This makes it possible to generate a variety of custom reports for tracking process performance across runs. The tool also has built in support for layered defect inspection and multi-layer review. NanoSpec 181 is a robust and reliable asset that is easy to use. It utilizes a clear and easy-to-navigate graphical user interface, and includes an intuitive defect inspector tool for quickly diagnosing and correcting defects. The model also includes an advanced debugging feature that is designed to allow engineers to quickly model and analyze defect trends and determine corrective action. Overall, NANOMETRICS NanoSpec 181 is an excellent choice for high resolution mask wafer inspection applications. It is easy to use and provides a wide range of features that make it an ideal choice for inspecting masks and wafers with feature sizes down to 0.2 microns. It is highly reliable and can help reduce process related defects, helping to ensure high product quality and reliability.