Used NANOMETRICS NANOSPEC 200 #9407282 for sale

NANOMETRICS NANOSPEC 200 is a mask and wafer inspection equipment designed for production testing and research applications. It combines high-resolution imaging capabilities with performance characteristics that meet the requirements of the industry's most demanding inspection tasks. NANOSPEC 200 offers a mask-to-wafer inspection capability, a programmable scanning stage, proprietary software for wafer alignment, advanced signal processing techniques, and a high-resolution imaging system. The high image fidelity and signal-to-noise ratio of this unit makes it ideal for inspections requiring precise micron-level measurements. NANOMETRICS NANOSPEC 200 includes an advanced imaging machine and optics, coupled with a high-resolution stage and scanning software. This tool has an imaging resolution of 5 nanometers and a dynamic range of 5 orders of magnitude, with sensitivity to 1 picometer. The imaging asset is capable of detecting defects and shapes as small as 5 nanometers, while the signal processing technology enables advanced measurements of optical parameters to 1 picometer. The model includes an adjustable wavelength and polarization filters which allow users to select the best parameters for their specific application. The programmable scanning stage offers a range of travel, as well as a high level of accuracy and repeatability. This allows for a wide range of sample sizes and types, from small chips to large wafers. Additionally, NANOSPEC 200 features a programmable sub-resolution mode, which allows for more accurate measurements of smaller objects, even if they are not visible in the standard imaging mode. The software also includes a comprehensive library of defect analysis routines and an intuitive interface ensuring fast and efficient inspections. Additionally, NANOMETRICS NANOSPEC 200 includes built-in Lithium Niobate (LiNbO3) for wafer chucking and a Bake In, Bake Out (BIBO) platform for temperature control and the curing of dopants. This equipment is also equipped with a motorized turret for multi-wavelength inspection, enabling simultaneous measurements of multiple parameters and optimizing inspection efficiency. Overall, NANOSPEC 200 provides a powerful combination of features designed to meet the needs of research and production environments. This system provides high-resolution imaging and performance characteristics that make it ideal for mask and wafer inspection tasks.