Used NANOMETRICS NanoSpec 210 #114973 for sale

NANOMETRICS NanoSpec 210 is a mask and wafer inspection equipment designed to monitor the surface topography of photomasks and wafers. NANOMETRICS NANO SPEC 210 utilizes the latest technologies in scanning tunneling microscopy to provide precise three-dimensional imaging of the surfaces for defect detection and characterization. Its optical system is designed to produce high-resolution images of the mask and wafer surfaces. NanoSpec 210 consists of a sample chamber with four quartz stages for positioning and scanning. The first two stages are used to load the sample into the chamber and position the scan probe. The next two stages are used to scan the sample with the probe. The sample chamber has three optical windows, one for the sample and two for image capture. NANO SPEC 210 is equipped with a high-resolution scanning tunneling microscopy (STM) unit to capture high-resolution images of the surfaces of the mask and wafer. The machine uses a probe with an extremely small tip to move across the surface of the sample and generate high-resolution images. NANOMETRICS NanoSpec 210 has an onboard control tool that allows the user to control the speed, direction, and power of the STM scanner. NANOMETRICS NANO SPEC 210 has built-in features to improve detection of defects on the surfaces of masks and wafers. It has pattern recognition algorithms for automated detection of defects. The asset also has a variety of image processing and filtering functions to help users analyze the images and detect defects. NanoSpec 210 is an effective tool for mask and wafer inspection. Its features allow users to quickly and easily monitor the surface topography of both masks and wafers for defect detection and characterization. Its automated detection algorithms and image processing capabilities are designed to improve the reliability and accuracy of defect detection and characterization. NANO SPEC 210 is an effective tool for monitoring and analyzing mask and wafer surfaces.