Used NANOMETRICS NanoSpec 210 #9057991 for sale
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ID: 9057991
Wafer Size: 6"
Film measurement system, 6"
Dual stage
Range of Thicknesses: 100 to 500,000 angstroms
Reflectance Mode
Thick Films, Reproducibility: 5A ± 5% depending upon the film type
Typical Measurement Time: 2.5 seconds
Olympus M10x and M40x objective
Spot Size:
50 um with 5x objective
25 um with 10x objective
6.5 um with 40x objective
Film Types:
Oxide on Silicon
Nitride on Silicon
Negative Resist on Silicon
Polysilicon on Oxide
Negative Resist on Oxide
Nitride on Oxide
Polyimide on Silicon
Positive Resist on Silicon
Positive Resist on Oxide
Options available: Olympus M5X and M100X.
NANOMETRICS NanoSpec 210 is a mask and wafer inspection equipment designed to inspect both nominal and non-nominal features with high accuracy and speed. The fully automated system is able to measure small features and defects down to 1 µm on 200 mm wafers. The unit contains components such as a high-resolution imaging machine with infrared optics, an optical profilometer and a wafer robot. The imaging tool employs a wide field of view for first pass inspection and a narrow field of view for high-resolution inspection. The optical profilometer is used for 3-dimensional surface profiling, while the wafer robot is used for handling wafers and positioning them properly on the asset for inspection. NANOMETRICS NANO SPEC 210 also has an advanced data processing unit that enables it to quickly identify and classify features, defects, and non-nominal structures. The model provides a detailed report and image of each inspected area, which can be used for further characterization and verification. The equipment also has various software tools such as a measured data analysis package (MDAP) and a virtual defect mask review package (VDMR). MDAP helps in quickly identifying and classifying complex defects, while VDMR provides a comprehensive overview of the inspection results for further diagnostics or defect classification. NanoSpec 210 is also suitable for inspecting flip-chip, micro-electromechanical systems (MEMS), and CMOS images with high accuracy. It is a reliable and cost-effective inspection solution for a variety of semiconductor processes. The entire system is housed in a single cabinet, making it easy to install and operate. The versatile standard configuration allows a wide range of inspection tasks to be completed without any hardware modifications. To sum up, NANO SPEC 210 is a sophisticated mask and wafer inspection unit. It is fast, reliable, and cost-effective, making it suitable for a wide range of semiconductor applications. It combines a high-resolution imaging machine, an optical profilometer, and a wafer robot with specialized software for inspecting and classifying both nominal and non-nominal features.
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