Used NANOMETRICS NanoSpec 210 #9256979 for sale

NANOMETRICS NanoSpec 210 is a powerful mask and wafer inspection equipment designed to help semiconductor design and lithography professionals achieve the highest level of accuracy and reliability for their most demanding applications. The system combines a wide range of inspection capabilities, such as advanced beam profiling, confocal microscopy, and overlay metrology, with an industry-leading level of automation to deliver the highest performance imaging for today's advanced devices. At its core, NANOMETRICS NANO SPEC 210 is powered by a high-resolution 5-axis stage unit, precisely controllable across its entire working surface. This stage is capable of supporting wafers up to 300mm in size and achieving X-Y speeds of up to 0.45 millimeters per second. The machine also employs an advanced imaging engine, which combines a 1664 x 1044 silicon CMOS image sensor with 10x reduction optics to provide fast, high-resolution imaging. The tool's beam profiling capabilities are unparalleled, with a wide range of tools to measure and characterize the incidence angle and spread of light. For example, the asset features a variable iris feature that allows users to adjust the size of the beam for greater accuracy while scanning, and a polarized illumination feature that can reduce contrast and decrease noise. NanoSpec 210 also features state-of-the-art overlay metrology capabilities, enabling users to measure alignment and overlay errors associated with advanced lithographic features. With a measurement range of up to 15 microns and a feature recognition algorithm that can automatically identify shifts and errors, this model makes alignment and overlay metrology a breeze. Finally, the inspection equipment also offers high-resolution confocal microscopy, allowing for measurements of feature size, nature, and shape well beyond the resolution of traditional microscopy. This highly accurate imaging technique can be used to accurately measure sub-micron structures and features, allowing users to detect even the slightest deviations. All in all, NANO SPEC 210 is a powerful mask and wafer inspection system designed to meet the rigors of even the most demanding semiconductor applications. With its robust imaging and measurement capabilities, this unit is perfectly suited to deliver the highest level of accuracy and reliability.