Used NANOMETRICS NanoSpec 210 #9294764 for sale

NANOMETRICS NanoSpec 210 is a comprehensive mask and wafer inspection equipment. It is designed to deliver the highest level of accuracy and precision needed for nano-scale analysis. NANOMETRICS NANO SPEC 210 is ideal for both die-on-wafer and mask inspection requirements. The system features a high resolution, high magnification column coupled with easy-to-use software and precise motorized X-Y stage for optimized pattern analysis and defect inspection. The imaging mode is based on a few-micron laser with diffracted and reflected near-field light collected by the monoclonic analyzing emission unit, providing good contrast and stable imaging. The machine is equipped with an ultra-high sensitivity sensor resulting in high resolution images. NanoSpec 210 tool combines advanced technology and an interactive user interface. It offers advanced aberration correction including both image quality improvement as well as angular resolution improvement, allowing for a high level of accuracy and defect detection. The asset also allows for the integration of an automated texture recognition and classification to achieve greater accuracy in defect detection. The model allows for easy and safe operation with a non-toxic universal substrate holder, which allows for flat-mounting on the wafer holder and vacuum locking. Its software enables automated wafer scanning for fast and accurate defect detection. It is also equipped with feature enhancement and analysis capabilities for efficient mask analysis and is capable of performing accurate wafer-to-wafer comparison. In short, NANO SPEC 210 is an ideal mask and wafer inspection equipment due to its high resolution, high magnification column, advanced aberration correction, automated texture recognition and classification, and efficient wafer scanning. It is the perfect system for producing accurate and precise nano-scale results.