Used NANOMETRICS NanoSpec 210 #9372725 for sale

NANOMETRICS NanoSpec 210 is a comprehensive mask & wafer inspection equipment designed to measure and analyze masks and bare wafers for defects. The system features a light source with a high power LED array that allows for bright illumination of a wide variety of substrates, including metal masks and wafers. NANOMETRICS NANO SPEC 210 also includes a high-quality, 5-megapixel CCD camera and a telecentric lens with an integrated field stop, allowing for precise measurement and inspection of wafer features with a resolution of up to 2.5 μm. The unit includes a full-featured metrology software package with custom functions for measuring and analyzing defects, as well as a calibration utility to ensure accuracy and repeatability. NanoSpec 210 uses laser-driven Image Sharpening (LIS) technology, a proprietary pattern recognition algorithm, and a high-speed defect detection machine to quickly and accurately identify defects, even those in the deepest recesses of a patterned mask. The tool is capable of automatically analyzing and grouping defects in a single measurement, increasing measurement accuracy as well as providing depth preferences for automatic review content. The highly sensitive algorithmic defect analysis engine allows for instant generation and analysis of automated defect list files, and the asset features a powerful image processing engine for mask and wafer repair, cleaning, and optimization. The model's advanced imaging and analysis capabilities extend beyond just identifying and analyzing defects. It can perform a wide range of analyses to reveal contact hole defects, die sizes and shapes, and traces, conductive layers, and more. The software allows users to quickly search for and compare different labels using parameters such as size, form, signal, and background, and it can measure, analyze, and log a variety of process parameters such as pitch, line width, feature size, overlay, and grayscale. In addition, NANO SPEC 210 is able to quickly generate a wide variety of image enhancement parameters to support difficult measurements. NANOMETRICS NanoSpec 210 is a highly robust equipment designed for use in harsh environments, such as semiconductor fabrication plants. The system is engineered with an energy-efficient, fan-less design that enables operation without emitting noise or vibration, and its highly durable construction allows for operation in a wider range of environmental conditions. The unit is also designed for easy integration with existing equipment, enabling seamless operation within existing production lines. Its intuitive user interface and dynamic visualization and analysis capabilities make it a great choice for quality control and yield optimization in industry-leading production facilities.