Used NANOMETRICS NanoSpec 210 #9374756 for sale

NANOMETRICS NanoSpec 210 is a state-of-the-art, full-field optical mask and wafer inspection equipment that utilizes advanced imaging technology for precise and accurate defect detection and characterisation. This system utilises an advanced optical inspection unit, which is based on a phase shifting interferometer (PSI). This interferometer uses multiple laser sources and a unique quadrant mirroring machine to generate a fully coherent beam of light that is then directed onto the mask or wafer being inspected. The tool then precisely and accurately measures any variations or defects in the sample surface, allowing for exceptionally accurate scans and inspection results. The mask and wafer inspection asset also features advanced imaging and control algorithms which are designed to detect and accurately measure both large and small defects. These algorithms enable the model to accurately detect and map out both deep and shallow defects, ensuring that no potentially damaging defects are overlooked. Additionally, these algorithms also provide superior mask and wafer alignment capabilities compared to more traditional inspection systems. NANOMETRICS NANO SPEC 210 equipment also features highly advanced digital image processing technology, which allows for the accurate measurement of defects with over 8 million pixels. This image resolution allows the system to perform high fidelity in-situ inspection, giving users the ability to quickly and accurately identify potential defect areas before any further processing or corrective action is taken. NanoSpec 210 also has several other features such as dynamic contrast control, which allows for the automated control of the unit's image contrast, and the ability to perform semi-automatic inspection, which requires minimal operator intervention. Additionally, the machine also supports full-field automated image stitching, which allows for the rapid collection of uniform and repeatable data. This also enables the tool to quickly pinpoint the location of potential defects. In conclusion, NANO SPEC 210 is a highly advanced mask and wafer inspection asset that utilizes advanced imaging technology, digital image processing, and sophisticated algorithms to accurately detect even the smallest of defects. The model's advanced capabilities, including its dynamic contrast control and full-field automated image stitching capabilities, allow for superior inspection results and significantly reduce production costs.