Used NANOMETRICS NanoSpec 2100 #293652555 for sale
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ID: 293652555
Film thickness measurement system
Photo multiplier tube
Wavelength gear
Voltage regulator PCB
R&R Microscope stand
Focus block, 6"
Microscope lamp
Optics: 5x, 10x, 40x
Conversion box
Keyboard
LCD Monitor
Power supply.
NANOMETRICS NanoSpec 2100 is an advanced mask and wafer inspection equipment designed for use in semiconductor manufacturing. It offers superior image resolution, sensitivity, and speed compared to traditional optical systems, helping ensure optimal product quality and reliability. The NanoSpec's optic system features a variable-angle zoom lens calibrated to inspect photomasks and reticles up to 200mm in size. The unit also supports high magnification levels up to 500x. Moreover, the optics on the NanoSpec are designed to reduce the effects of ambient light and stray radiation, making it well-suited to detecting subtle defects at the nanometer scale. The NanoSpec also incorporates an efficient motorized stage mechanism. This allows it to quickly and accurately scan both wafer and masks with a repeatability of ±0.1µm. The machine also utilizes a bright LED light source, providing optimal lighting conditions to identify critical defects. In addition, the NanoSpec features high-speed detection and analysis capabilities. Its on-board processing unit can identify and remove unnecessary images, enabling it to scan high-density images rapidly. Moreover, it provides in-depth inspection results - including feature size, shape, and process control data - in multiple formats, making it well-suited for process troubleshooting and data analysis. Lastly, the NanoSpec is designed for ease of use. It features an intuitive user interface, allowing users to easily set up and control the tool. Furthermore, with its built-in safety mechanisms, users can confidently operate the asset without the need for additional protective equipment. In conclusion, NanoSpec 2100 is an advanced and highly capable mask and wafer inspection model. It provides superior image resolution, sensitivity, and speed to identify and address subtle defects, making it ideal for semiconductor manufacturing and testing.
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