Used NANOMETRICS NanoSpec 212 #9217219 for sale

NANOMETRICS NanoSpec 212 is an advanced mask and wafer inspection equipment that utilizes a combined laser and light scattering measurement technique. This system is designed for the applications of inspecting patterned photomasks and wafers for pattern correcting, inspecting patterns, and detail resolution measuring. As an industry-leading metrology tool, NanoSpec 212 offers the highest speed, best repeatability and the most precise imaging capability available in a non-contact tool. NANOMETRICS NanoSpec 212 consists of three main elements. These are the probe chamber, the illumination unit, and the detector. The probe chamber is designed to create an extremly stable environment wherein scanning occurs. The highly synchronized workings of the machine allow for even and constant illumination, leading to great uniformity. An aspheric condenser is used to collimate the laser beam in the chamber and the scanner integration ensures accurate and repeatable measurements and imaging. The illumination tool includes a laser source and optics designed to yield a uniform, reproducible spot size and intensity. The laser is configured with a specific wavelength depending on the application. This asset allows for wide line width or mask feature requirement resolution. The detector is comprised of a silicon camera and imaging firmware designed to detect the light scattered from the diffractive grating and create a digital image in the display. This image is then transferred to the software for analysis. Through this procedural process, NanoSpec 212 is capable of analyzing all types of mask patterns and features and provide unparalleled imaging and accurate measurements. NANOMETRICS NanoSpec 212 is equipped with an intuitive UI and software to enable quick and easy model control. The software and data analysis includes a broad suite of features that facilitates the efficient monitoring and processing of the data. This allows for high resolution imaging, accurate measurements, mask and wafer inspection, and more. Overall, NanoSpec 212 is a highly advanced mask and wafer inspection equipment that utilizes laser and light scattering techniques. The stable probe chamber, illumination system and detector, coupled with a user-friendly software provides highly precise imaging, superior accuracy measurements, and accurate data analysis. This makes NANOMETRICS NanoSpec 212 the perfect tool for the inspection industry.