Used NANOMETRICS NanoSpec 3000 #9187358 for sale

ID: 9187358
Wafer Size: 3"-6"
Vintage: 2006
Film thickness measurement system, 3"-6" With IRVINE Ultrastation 3.B autoloader Solid stage linear diode array detector (15) Standard film types Measurement time: 0.25 s to 4 s per site Data management: Statistical data analysis Data export (ASCII) Hardware configuration: Optics: 10x Spot size: 25 μm Computer: 333 MHz PC With 3.2 G hard dive, 64 RAM Performance: Film: (3) Layers Film thickness range: 250 A to 35 µm Wavelength range: 480-800 nm Reproducibility: <2 A Electrical power: 117±5% VAC, 50/60 Hz, 5 A 230 V, 50/60 Hz, 2.5 A 2006 vintage.
NANOMETRICS NanoSpec 3000 is a mask & wafer inspection equipment designed to meet the industry's most exacting requirements. It features a high-speed, high-resolution digital imaging system and an advanced, proprietary tool suite that is tailored for the inspection of masks & wafers with high accuracy and repeatability. The unit's advanced optical and mechanical components allow for a wide range of critical imaging needs. It features diagonal-type optical objectives with variable zoom capabilities and a highly reflective penta-prism imaging mirror, ensuring optimal image capture speed and repeatability. NanoSpec 3000 also employs a digital motorized XY-Knife laser autofocus machine, which is designed to provide a stable, dynamic focus over all areas of the wafer or mask. NANOMETRICS NanoSpec 3000 also includes a range of features that extend the tool's usefulness, such as the Mask Analysis Tool. This is designed to accurately compare masks to the original design during the wafer fabrication process. It performs mask parameter extraction fast and accurately, using advanced algorithms to correct for optical and geometrical distortions. The asset also provides an optional geometric distortion correction algorithm, allowing users to account for aberrations introduced during photomask manufacturing. This is achieved using a proprietary array of parameters, ensuring that images remain perfectly aligned with the original design. In addition, NanoSpec 3000 provides a range of data-acquisition options, including the Nanometer® Digital Imaging Model. This equipment combines a high-resolution, high-speed image acquisition system with a suite of advanced data analysis and image processing tools. It is designed to allow users to quickly and easily review, compare and analyze the data generated by NANOMETRICS NanoSpec 3000. NanoSpec 3000 also provides a wide range of optional accessories, such as an automated wafer handling unit, a robustwafer identification machine and a powerful visualization tool. All of these features make NANOMETRICS NanoSpec 3000 an ideal choice for the demanding mask & wafer inspection needs of the semiconductor industry.
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