Used NANOMETRICS NanoSpec 3000 #9220802 for sale

ID: 9220802
Wafer Size: 3"-6"
Vintage: 2001
Film thickness measurement system, 3"-6" Solid stage linear diode array detector (15) Standard film types Measurement time: 0.25 s to 4 s / site Data management: Statistical data analysis Data export (ASCII) Hardware configuration: Optics: 10x Spot size: 25 μm Computer: 333 MHz PC With 3.2 G hard dive, 64 RAM Performance: Film: (3) Layers Film thickness range: 250 A to 35 µm Wavelength range: 480-800 nm Reproducibility: <2 A Electrical power: Lamphouse: 50 W 117±5% VAC, 50/60 Hz, 5 A 230 V, 50/60 Hz, 2.5 A 2001 vintage.
NANOMETRICS NanoSpec 3000 is a high-performance mask and wafer inspection equipment that incorporates advanced technologies to provide high-quality imaging and a wide variety of defect detection capabilities. NanoSpec 3000 utilizes four channels to collect a variety of high-resolution images, utilizing CMOS technology and high-end optics for excellence in both resolution and contrast. The four channels are visible for pattern inspection, near infrared (NIR) for CD measurement and overlay inspection, violet (Vis) for 2D edge and wafer shape scanning, and UV for 3D topography analysis. These channels work in tandem to provide the user with comprehensive information on both the images taken and the defects present. The system includes an integrated full-field search engine, which helps speed up inspection time and makes trends in defectivide images more visible. NANOMETRICS NanoSpec 3000 also includes an extensive library of sample masks and wafers, allowing for fast setup and comparison, and a high-performance defect manager to compare potential defects against expected device parameters, providing users with valuable fault information. NanoSpec 3000 also features advanced automation capabilities, which include multi-stage wafer holding, 360-degree wafer scanning, and high-precision needle alignment. With these advanced features, NANOMETRICS NanoSpec 3000 is capable of providing fast, accurate, and repeatable inspection even under changing production conditions. Furthermore, the unit is equipped with an advanced software suite that allows users to control the whole workflow, edit measurements, and perform analysis on the test images and data. To ensure reliability, NanoSpec 3000 is optimized for a wide range of wafer substrates and thicknesses, and the machine is designed to meet all applicable safety standards. With the trusted performance and consistent accuracy, users can rely on NANOMETRICS NanoSpec 3000 for superior wafer and mask inspection results.
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