Used NANOMETRICS NanoSpec 4150 #9069402 for sale

NANOMETRICS NanoSpec 4150 is a high-performance mask and wafer inspection equipment designed to provide superior accuracy and speed for inspecting and analyzing masks and wafers. NanoSpec 4150 features a hybrid scanning system composed of a patented scan head, a wide-angle scan lens, and a gas discharge tube (GDT) for spatially enhancing contrast resolution. The scan head offers precise control of the laser beam so that each field of view can be scanned with maximal precision. Additionally, the wide-angle scan lens and GDT provide greater image contrast and more detail than other scanning systems, resulting in more accurate analyses. NANOMETRICS NanoSpec 4150 is designed to be highly flexible and adaptable, with the ability to rapidly scan both mask and wafer substrates and provide results in real time. An integrated software unit allows for quick and easy operation, and includes a wide variety of mask and wafer analysis software tools and algorithms. The machine can also be integrated with Metrology, Failure Analysis, E-beam, and other systems, allowing for comprehensive characterization of the semiconductor process. NanoSpec 4150 boasts an impressive line of detection and analytical capabilities, such as automatic dislocations, aerosol detection, defect identification, line of sight inspection, and other advanced imaging techniques. These features are complemented by an array of other functionalities, including color and gray-scale imaging, and quantitative measurements of area coverage, grain size, line-edge roughness, particle count, and other parameters. Beyond its advanced imaging and analysis capabilities, NANOMETRICS NanoSpec 4150 also offers metrology for critical wafer dimensioning and characterization. The metrology tool can accurately measure a variety of parameters, including circuit line widths, line spacing, and other relevant features. Overall, NanoSpec 4150 is a powerful, fast, and highly accurate mask and wafer inspection asset. Its combination of advanced scanning and imaging technology, powerful software, and comprehensive analytical capabilities make it an invaluable tool for characterizing and understanding semiconductor processes.