Used NANOMETRICS NanoSpec 4150 #9105594 for sale

NANOMETRICS NanoSpec 4150
ID: 9105594
Film thickness measurement system.
NANOMETRICS NanoSpec 4150 is a micro-inspection technology that combines advanced optics and a high-resolution color digital camera to enable inspection of both masks and wafers in the semiconductor industry. The tool provides highly detailed images of defects, as well as providing tool settings for specific defect areas to allow for dimensional evaluation. NANOMETRICS NanoSpec platform consists of a high-resolution 3 CCD camera and an LED light source, providing excellent image contrast and resolution. The camera allows both wafers and masks to be inspected at the same time and at the same magnification, delivering accurate defect information. The Multi-Point Image Analyzer (MPIA) technology utilizes a spatial sampling algorithm to detect and measure microscopic defects such as pits, protruding grains, edges, or foreign materials, which can be quickly identified and classified according to size and shape. NanoSpec 4150 equipment is highly reliable and can perform extremely precise measurements and evaluations of nano-scale defects. Its sophisticated metrology system performs 12.5 μm x 6.2 μm step size, enabling the integration of the most stringent test design requirements. The highly automated process ensures that accurate data is acquired quickly and efficiently. NANOMETRICS NanoSpec 4150 unit has high throughput; it can acquire thousands of images per second, providing highly reliable object detection and inspection, even in extremely challenging applications. Its built-in defect classification and analysis algorithms can quickly identify foreign particles, as well as evaluate their dimensional properties, including area, diameter, shape, distance, angle, and curvature. NanoSpec 4150 is equipped with image acquisition and wafer measuring software, allowing users to efficiently monitor process changes and provide detailed information about the measured components. In addition, the NanoSpec machine has the capability to automatically measure overlay and critical dimension of the wafer pattern in the context of the defects found. NANOMETRICS NanoSpec 4150 offers an unparalleled resolution and flexibility, providing the highest quality and inspection performance. The tool's automatic defect classification and superior image resolution make it the ideal tool for inspecting accurately and quickly both masks and wafers, reducing process errors and improving yield.
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