Used NANOMETRICS NanoSpec 6100 #9105595 for sale

NANOMETRICS NanoSpec 6100
ID: 9105595
Film thickness measurement system.
NANOMETRICS NanoSpec 6100 is a high performance mask and wafer inspection equipment. It is designed for use in a production or laboratory setting, featuring a flexible design with automated mask and film inspection capabilities. The system utilizes advanced technology including a high-resolution CCD camera, laser diffraction optics, and an automated inspection stage. The camera provides a bright, clear view of the inspection area, allowing operators to quickly and accurately analyze samples. The laser diffraction optics ensures accurate measurements, even at the nanometer level. Additionally, the automated inspection stage allows operators to quickly inspect masks and films to assure alignment accuracy and quality control. NanoSpec 6100 also features advanced software tools for data management and analysis. Its software package supports a range of data types, such as binary input for computer-aided design (CAD), and custom drawing files for CAD, as well as the import and export of data. The software also supports batch processing, allowing users to quickly and easily process multiple masks and films. NANOMETRICS NanoSpec 6100 includes an integrated set of hardware and software tools, and is designed to work in a fully automated way. It uses a range of software algorithms to automate mask and wafer inspection tasks. The unit's advanced software tools enable intuitive user interface that simplifies operation, allowing users to quickly and easily process masks and wafers. The machine also offers integrated wafer management and data analysis capabilities that enable higher throughput rates. NanoSpec 6100 is an ideal solution for semiconductor manufactures, lithography process engineers, and research & development laboratories. The tool provides accurate, reliable, and reproducible data, allowing for precise fabrication monitoring and control. It can also be used to rapidly identify problems associated with mask alignment, pattern distortion, and other defects. Moreover, the asset's flexibility and efficiency allows it to be adapted to a wide range of applications and sample sizes.
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