Used NANOMETRICS NanoSpec 6100 #9160215 for sale
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ID: 9160215
Vintage: 2003
Film thickness measurement system
Software version: 1.63
Wavelength:
Visible wavelength: 250 nm to 800 nm
White lamp (Halogen lamp)
UV Option
2003 vintage.
NANOMETRICS NanoSpec 6100 is a next-generation, state-of-the-art mask and wafer inspection equipment. This high-speed, automated system delivers rapid and accurate graphical characterization of multiple metrology and inspection tasks, for example, to measure die to edge, die to die, die-edge position, and overall mask defects. With superior, high pixel resolution, NanoSpec 6100 offers advanced surface/gratings analysis. The advanced product design of NANOMETRICS NanoSpec 6100 includes a fully motorized, computer-controlled, six-axis motor with optical navigation, ensuring accurate, high-resolution spot scanning and walking scan metrology techniques. It is also compatible with a variety of nanomechanical metrology techniques, including atomic force microscopy (AFM) and nanoscratch metrology, which facilitate data analysis and 3D topographic profile generation for characterization of surfaces at the nanometer resolution level. NanoSpec 6100 offers a robust suite of image processing and analysis algorithms, to automate feature recognition, classification, and characterization. It also has a suite of advanced inspection algorithms such as 3D and 2D image processing, part-to-part, cross-section, and shape-based comparison, leading to reliable defect identification. This unit performs automated defect inspection, translating the visuals data into a categorized defect list, with automatic alignment, parameter comparison, and optimized cataloguing of defects, including location sorting. NANOMETRICS NanoSpec 6100 is user-friendly and easy to operate, featuring a clear graphical user interface, allowing for easy parameter entry and result evaluation in real-time. It also offers a wide range of reports and graphical displays of metrology data, presentation of detected errors, and statistical summary to help in obtaining the highest quality inspection results. In all, NanoSpec 6100 provides next-generation mask and wafer inspection that is fast, accurate and efficient. With its range of powerful metrology and inspection advantages, this machine is designed to facilitate seamless, automated inspection results for a wide variety of applications such as semiconductor fabrication, flat-panel display, and optical inspection.
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