Used NANOMETRICS NanoSpec 6100 #9282618 for sale
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ID: 9282618
Vintage: 2001
Film thickness measurement system
Cables included
Objectives: 4x, 10x, 40x
Power supply: 115 V, 5 A, Single phase
2001 vintage.
NANOMETRICS NanoSpec 6100 is an advanced mask and wafer inspection equipment designed to provide the highest level of accuracy and reliability in teaching and performing critical processes of nanosensor manufacturing. This system enables customers to create highly reliable and cost effective masks and wafers for their semiconductor applications. NanoSpec 6100 uses high-resolution visualization, enhanced operational speed, and fully automated image analysis to detect and classify individual features as small as 50 nanometers in diameter. This allows for a high level of accuracy and consistency when inspecting the mask and wafers. The unit is also capable of capturing full images in vertically merged stereo images, which is especially useful for inspecting 3D masks. The fully automated image analysis capability of the machine enables it to effectively enhance contrast and remove artifacts from images in order to thoroughly inspect both the mask and wafer. In addition, the tool can quickly recognize errors and implement corrective measures on-the-fly as needed. The asset can be used to analyze a variety of electrical and optical designs, including wire bonding, pads and via formation, photolithography, and fine line circuit traces. This is made possible through its strong software capabilities, which allows it to handle both 2D and 3D characteristics of a design. Additionally, the model can be used with a wide range of wafer geometries and design styles. NANOMETRICS NanoSpec 6100 also offers easy to use, intuitive operation with a state of the art user interface that enables operators to quickly navigate through its features. The equipment is powered by a high-speed processing unit and has the resources to handle large dataset analysis with minimal delay. Overall, NanoSpec 6100 is an advanced, accurate, and reliable system for inspecting mask and wafer designs. With its ability to quickly detect and classify features as small as 50 nanometers in diameter and its intuitive user interface, the unit is an ideal tool for customers in need for high quality and reliable nanosensor production.
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