Used NANOMETRICS NanoSpec 6100 #9372486 for sale

NANOMETRICS NanoSpec 6100 Mask & Wafer Inspection equipment is a high-performance imaging and optical metrology tool developed by NANOMETRICS for high-precision, high-resolution, scan-level evaluation of advanced device features. The system takes advantage of the latest optical microscope, digital imaging, measurement software and computer control technology, and is designed to rapidly acquire, process, analyze and report comprehensive information about the mask and wafer structures of the most complex semiconductor devices. NanoSpec 6100 is specifically engineered for the accurate measurement of optical patterns on the nanoscale, such as those required for high brightness flat panel displays (FPDs). This unit uses a proprietary, digital spot autofocus machine that performs fast, defocusing-based, focus stitching with high-accuracy, real-time measurement results. NANOMETRICS NanoSpec 6100 reporting tools include powerful software that combines data from multiple layers into a single report. This includes high-resolution scan-level imaging, layer-by-layer model-based imaging, fine alignment capability, and an extensive range of measurements. Additionally, the tool offers a wide variety of custom features to validate measurements including the ability to evaluate the impact of multi-layer mask alignment errors and devise process optimization plans. NanoSpec 6100 is also capable of real-time imaging and inspection through its advanced multi-reflection and reflection loss capabilities. These allow the asset to quickly provide a vast array of results with fewer measurements. Additionally, to ensure the highest accuracy of measurements, the model is equipped with high-sensitivity tilt and level sensors to reduce repeatability errors. NANOMETRICS NanoSpec 6100 includes a highly flexible software architecture, which is designed to interface with a variety of external instruments. This includes, but is not limited to, X-ray diffraction, Atomic Force Microscopy, Interferometer and Scanning Electron Microscopy applications. Additionally, a comprehensive suite of analysis tools, such as Design of Experiments, and multi-dimensional curve fitting are included with the equipment. With its intuitive user-interface, advanced scanning and metrology features, and the ability to generate highly accurate and reliable results, NanoSpec 6100 Mask and Wafer Inspection system is an ideal solution for fast and accurate measurement and analysis of advanced device patterns.