Used NANOMETRICS NanoSpec 6100 #9408485 for sale

NANOMETRICS NanoSpec 6100 is a specially designed mask and wafer inspection equipment built with state-of-the-art imaging, scanning, and measuring technology. The system is capable of analyzing masks and wafers with up to 8k resolution and enables measurement of data with a repeat accuracy of below 10nm. NanoSpec 6100 was designed for the inspection of large-scale masks and wafers, both in the pre-production and production stages, in a variety of industries including semiconductor, photomask, printed wiring board and electronic packaging. The unit is equipped with a motorized stage for automated sample scanning; a dual-axis motorized height adjustment for fast and efficient measurement of samples; and a patented algorithm for intelligent aberration correction. These features make it capable of detecting defects as small as 1.0uM over a large area, providing reliable detection with less variability. It can inspect masks up to 575 x 489mm in size and wafers up to 4" or 200mm in diameter. In terms of data output, the machine can provide high contrast images and generated defect map with false contrast enhancement, dark contrast enhancement and color contrast enhancement. In terms of its imaging capabilities, NANOMETRICS NanoSpec 6100 uses a Raman confocal (RCM) tool, which is an advanced imaging method that uses biological contrast mechanisms to generate optical sectioning without physical ablation. The RCM asset offers a wide range of resolution capabilities and can image complex surface structures that other imaging techniques can't achieve. The model further offers fully automated on-situ defectivity analysis to provide comprehensive data output for defect analysis. This means the automated report generated by the equipment contains detailed information about the material structure, defect characteristics, and potential cause of defects. Finally, NanoSpec 6100 offers a special feature which allows a user to set up inspection parameters according to the surface defects that need to be inspected. This allows for an increased flexibility in inspecting a wide range of surfaces. Overall, NANOMETRICS NanoSpec 6100 is a highly advanced mask and wafer inspection system that combines state-of-the-art imaging and scanning technologies and offers automated defectivity analysis to provide comprehensive results. The unit is capable of detailed analysis and measurement of complex materials, making it a great choice for inspecting high-quality masks and wafers.