Used NANOMETRICS NanoSpec 8000 #9241928 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 9241928
Vintage: 1997
Automated film thickness metrology system
Film types measured:
Typical range:
Single layer films:
Visible: 200 Å - 30 µm
UV: 25-500 Å
Double layer films:
Visible:
Top layer: 100-30000 Å
Bottom layer: 100-10000 Å
Single layer thick films:
Visible: 4-30 µm
Absolute and relative reflectance:
Visible: 400-800 nm
UV: 210-400 nm
Oxide on poly:
UV: 150-10000 Å
Oxide on metal:
Visible: 3000-20000 Å
UV: 500-5000 Å
Refractive index: 1000-10000 Å
Typical precision:
Single layer films:
Visible: 0.1% or 2 Å min
UV: <1 Å
Double layer films:
Visible:
Top layer: 0.1% or 2 Å min
Bottom layer: 0.1% or 2 Å min
Single layer thick films:
Visible: 0.5%
Absolute and relative reflectance:
Visible: <0.4%
UV: <0.4%
Oxide on poly:
UV: 0.1% or 2 Å min
Oxide on metal:
Visible: 0.1% or 3 Å min
UV: 0.1% or 3 Å min
Refractive index: 0.0005
1997 vintage.
NANOMETRICS NanoSpec 8000 is a mask and wafer inspection equipment from NANOMETRICS designed for defect detection in micro and nano-scale device fabrication. The system features an automated software unit with parameters-based algorithm filters for accurate defect inspection, as well as imaging and data acquisition capabilities. It has a maximum image resolution of 10um/pixel, with customizable parameters for both optical and electrical properties of materials used in the fabrication process. The machine is easy to use and is equipped with motion control and sophisticated software for automation of the imaging process. The processor also includes a variety of edge and pattern detection functions for efficient data acquisition. NanoSpec 8000 utilizes advanced optics to acquire a variety of critical information, such as line and edge widths, symmetry of lines and edges, and depth of processing features. Furthermore, it utilizes a four-way Illumination Tool to provide an ideal balance of imaging conditions, including low angle lighting for high speed measurement, and focused lighting to aid in resolution requirements. NANOMETRICS NanoSpec 8000 is capable of quickly and accurately imaging devices at various levels of complexity in a variety of materials. NanoSpec 8000 has been designed to reduce the complexity of workflows and maximize throughput. It is equipped with an intelligent and programmable interface, allowing for easy operation of even the most complex imaging measurements. Additionally, the asset also ensures efficient, safe, and secure data handling. In conclusion, NANOMETRICS NanoSpec 8000 is suitable for use in a wide range of inspection tasks including mask and wafer fabrication. It is capable of providing high resolution imaging for defect detection and has an intuitive user interface for maximum efficiency. It also offers a variety of imaging functions and edge and pattern detection tools for easy data acquisition, as well as a secure platform for data storage.
There are no reviews yet