Used NANOMETRICS NanoSpec 9010 #293650063 for sale

NANOMETRICS NanoSpec 9010 is a highly capable, multi-sensor critical dimension (CD) and overlay mask and wafer inspection equipment. This system provides a unique capability to measure, quantify, and map a range of critical dimensions from the finest circuit elements presented on micro-lithographic masks and wafer surfaces. The measurement capabilities range from the simplest structures, as small as 6nm in size, to the most complicated structures such as large-scale vias, embedded features, and over-lays. In addition, dynamic imaging and feature recognition provide unparalleled accuracy and analysis capabilities. NanoSpec 9010 likewise possesses robust Distortion and Fluctuation Analysis (DFA/DFA) and Edge Noise Inspection (ENI) capabilities, which enable a wide range of non-uniformity and astigmatism to be measured on both mask and wafer sections. As such, the unit is ideal for sub-nanometer registration and overlay applications, such as the registration of contact and loading alignment layers, enabling an enhanced yield in the production process. In step scan mode, NANOMETRICS NanoSpec 9010 features an unprecedented resolution of 0.5 nanometer, enabling the highest accuracy and precision achievable in measuring extremely tiny features as small as 6 nanometers. The machine also features an optional Overlay Sub-nanometer Mode, which enables it to deliver sub-nanometer overlay measurements with repeatable accuracy. NanoSpec 9010 provides unparalleled imaging and analysis capabilities, with an incredibly powerful software suite. At the core of the tool is the unique 360° imaging feature, which enables nanometer-scale measurements made in both vertical and horizontal directions, to be easily compared and analyzed. The combination of image capture, analysis, and reporting capabilities delivers unrivaled results for critical dimension, overlay, distortion and fluctuation, and edge noise measurement applications. In summary, NANOMETRICS NanoSpec 9010 is an unparalleled asset for CD and overlay mask and wafer inspection applications. With superior resolution, image capture and analysis capabilities, as well as DFA/DFA and ENI, the model provides an unprecedented level of accuracy, repeatability, and reliability. Moreover, NanoSpec 9010 features an intuitive and powerful software suite, making it easy to use and monitor results. As such, the equipment is the ideal choice for engineers and production staff in advanced semiconductor mask and wafer inspection applications.