Used NANOMETRICS NanoSpec 9100 #9271374 for sale

NANOMETRICS NanoSpec 9100 is a cutting-edge mask & wafer inspection equipment from NANOMETRICS. It is a leading-edge tool for the accurate examination & measurement of photolithography masks and wafers. NanoSpec 9100 features a precise 42 cm x 43 cm field of view, offering maximum flexibility for inspection capabilities. This innovative system utilizes a sophisticated imaging optics array to capture individual images of each layer of a photolithography mask or wafer. The images are then evaluated for any defects, allowing users to identify and remedy any anomalies as soon as possible. The unit has two main components: the Camera Navigation Machine (CNS) and the Image Overlap Tool (IOT). The CNS uses a variety of algorithms to precisely navigate the imaging optics array over the surface of the mask or wafer, ensuring that all areas are inspected. The IOT combines up to 8 images together using a patented blend algorithm to maximize clarity and ensure that small defects can be properly detected and quantified. NANOMETRICS NanoSpec 9100 is also capable of performing advanced analysis operations, such as automated measurement and detection of critical dimensions, line widths, overlay errors, and process window qualification. It features a user interface that allows users to easily manage and control the tool, enabling fast and accurate data acquisition. In addition to its impressive features, NanoSpec 9100 also offers unparalleled performance. It can process more than 8,000 images per hour with high accuracy, allowing for rapid measurements and detection. Additionally, the asset is designed to be extremely reliable, ensuring that it is able to work continuously over a long period of time. NANOMETRICS NanoSpec 9100 is a cutting-edge mask & wafer inspection model that offers the highest level of accuracy and reliability for photolithography applications. Its precise imaging optics array, user-friendly interface, and automated analysis features make it a powerful and essential tool for any photolithography facility.