Used NANOMETRICS NanoSpec 9100 #9300303 for sale

NANOMETRICS NanoSpec 9100
ID: 9300303
Wafer Size: 6"
Film thickness measurement systems, 6".
NANOMETRICS NanoSpec 9100 is a mask and wafer inspection equipment designed for high performance automated optical inspection. This system utilizes sophisticated image processing algorithms to identify and classify features from die-level, wafer-level, and mask-level devices. It has an automated optical inspection operation that enables fast, accurate and repeatable inspection of die, wafer, and mask samples. The inspection process utilizes real-time digital imaging to capture defect images, which are then processed by a dedicated software interface. The unit can be configured with an integrated high-resolution CCD camera and a specialized optics package configured to meet a variety of application needs. This machine employs a variety of illumination techniques including polarized, oblique angle illumination, laser diffraction pattern, and white-light scatter. It also supports a powerful pattern recognition software algorithm that is capable of identifying and classifying specific features, such as scratches, stains, and protrusions. NanoSpec 9100 features a scan head with a large field of view, allowing for simultaneous inspection across a wide range of sample sizes and shapes. This tool is capable of yielding high defect detection accuracy at speeds of up to 10,000 pixels per second. With its advanced edge detection capabilities, it can detect small defects, while also providing a high degree of precision in measurement. The asset also boasts a number of advanced features, such as automated defect classification, powerful defect analysis capabilities, and high-grade grade operator control and reporting features. It is also capable of providing simultaneous multi-layer device inspection and wafer die-level inspection. In addition, the model has a user-friendly graphical user interface, making it easily operated by non-technical personnel. NANOMETRICS NanoSpec 9100 is a cost-effective tool for any production facility looking to improve process control and reduce scrap cost. With its high-quality imaging and powerful intelligence, it is capable of detecting even the most difficult-to-see defects, while also ensuring the most accurate and repeatable results from wafer to wafer and mask to mask. This equipment is a great option for anyone looking for a reliable and well-designed mask and wafer inspection system.
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