Used NANOMETRICS NanoSpec 9300 #9241417 for sale

NANOMETRICS NanoSpec 9300 is a next-generation mask and wafer inspection equipment developed by NANOMETRICS, Inc. The system offers high-quality linear and 2D inspection for advanced and leading-edge technologies, allowing users to monitor critical processes and check for defects with unmatched accuracy. NanoSpec 9300 integrates a proprietary optical imaging platform with powerful, custom-tailored hardware, application-specific algorithms, and sophisticated analytics to provide ultra-high throughput pattern review. The unit is designed for use in high-definition lithography and patterned wafer applications, such as extreme ultraviolet (EUV) or extreme deep-UV (EDUV) lithography. NANOMETRICS NanoSpec 9300 offers a versatile toolset for mask and wafer inspection, featuring integrated optical metrology, defect detection, automated wafer and mask alignment, and comprehensive documentation and reporting capabilities. Combined, these features give users ultimate flexibility and control during process development, enabling high-precision imaging and defect detection. NanoSpec 9300 is powered by a custom-designed imaging platform, providing extensive capabilities for interactive pattern identification and detailed defect analysis. The machine features a 5µm-laser head, providing maximum resolution and contrast for detailed imaging and analysis, with an average pixel size of 1.2nm. The tool's high-resolution optical sensor offers an array of high-sensitivity detector pixels, enabling automated pattern mapping and comprehensive defect inspection. NANOMETRICS NanoSpec 9300 is also equipped with powerful application-specific algorithms, allowing users to quickly identify mask and photomask defects, allowing them to take the necessary corrective action earlier in the production cycle. Additionally, the asset offers a range of automated wafer inspection tools and a comprehensive suite of reporting and documentation capabilities, allowing users to monitor processes in real-time and track key performance metrics. Finally, NanoSpec 9300 includes a wide range of customization capabilities, making it a versatile platform for a variety of production processes. The model features proprietary software tools for parameter optimization, allowing users to tailor inspection processes to the individual needs of their production environment. The equipment also supports simultaneous support for multiple industry standards, allowing users to use the same platform for multiple production and development processes, saving precious time and resources.