Used NANOMETRICS NanoSpec AFT 181 #9398849 for sale

NANOMETRICS NanoSpec AFT 181 is a mask & wafer inspection equipment that provides customers with the industry-leading accuracy and throughput they need. This system utilizes advanced electronics and optics technologies that deliver the highest precision, highest accuracy and highest throughput available. In addition, the unit can be configured to meet virtually any inspection application requirements that a customer may need. NanoSpec AFT 181 uses advanced auto focusing technology (AFT) to automatically adjust the focus of the optics based on the wafer or mask pattern. This technology ensures that the inspection is done efficiently and accurately at the highest possible resolution. The machine also incorporates a dual laser source, allowing for both brightfield and darkfield imaging as needed. This means that the tool can be easily adapted to different tasks like lithography and etching inspection, defect review and correction based on various mask and wafer patterns, and reticle inspection. NANOMETRICS NanoSpec AFT 181 offers a wide range of sensors and optics for both surface inspection and cross-sectional profile. For the surface inspection it is possible to perform high resolution optical inspections of masks, wafers and substrates. Furthermore, it supports a variety of wafer and mask scanning modes, including tiled scanning, single-pass continuous scanning, and highly efficient dual-pass scanning mode. For cross-sectional profile inspections the asset features an in-board spectrophotometer. This ensures that high resolution metrology of the samples is achieved. The spectrophotometer uses advanced 3D imaging to measure the shape of the sample, providing accurate data on the height, width, and topology of the sample. In addition, the model features a variety of additional components that all work together as a complete inspection solution. These components include advanced image capture and pre-processing hardware and advanced reporting and analysis software that enable customers to quickly identify defects and monitor wafer and mask production processes. NanoSpec AFT 181 offers customers a high-performance mask and wafer inspection equipment that delivers accuracy, throughput, and flexibility in a compact, easy-to-use package. With its robust optics, high-leveldetection algorithms and advanced image processing techniques, this system provides customers with the reliability and accuracy they need to ensure the quality of their parts.