Used NANOMETRICS NanoSpec AFT 200 #9004058 for sale

ID: 9004058
Film thickness measurement system.
NANOMETRICS NanoSpec AFT 200 is a high-end mask and wafer inspection equipment produced by NANOMETRICS. It is designed to detect defects and other irregularities in masks and wafers with sub-micron precision. Its unique combination of advanced optical technologies allows it to produce accurate images of complex nanostructures, while its automated scanning and processing capabilities enable it to offer high throughput rates. The main components of the AFT 200 include the main optics, a wide range angle of view detector, and the integrated imaging software. The main optics contain various objective magnifications, laser beams, and optics for back-reflection detection, allowing it to produce high-quality images of any mask or wafer. Its high aperture and short working distance also ensure that the system can accommodate a wide range of sample sizes. The wide angle of view detector is used to capture a precise image of the sample, with high resolution and contrast. It consists of an illumination source, a numerical aperture objective, and a CCD camera. This allows the unit to capture images that contain both large and small details, making it ultra-flexible for even the most complex samples. Finally, the integrated imaging software enables users to perform sophisticated image processing and defect analysis on the captured images. This software automates the various steps of image analysis, allowing for quick and accurate analysis of the images and detection of any irregular patterns or defects. NANOMETRICS AFT 200 is therefore a powerful and reliable machine for the inspection of masks and wafers with sub-micron precision. Its wide array of optics and imaging technologies enable it to accommodate a range of sample sizes and provide accurate defect analysis. The automated scanning and processing capabilities also enable it to offer high throughput rates, making it an invaluable tool for any mask and wafer inspection tool.
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