Used NANOMETRICS NanoSpec AFT 200 #9246131 for sale

NANOMETRICS NanoSpec AFT 200 is a high-precision mask and wafer inspection equipment that offers the highest resolution imaging available on the market. The system utilizes advanced optical imaging techniques to obtain extremely detailed images of the photomasks that are used as templates in the manufacture of integrated circuits and other printed circuit boards. NanoSpec AFT 200 features a state-of-the-art optical unit with a spectral response from visible to ultraviolet light. This allows the machine to detect defects and irregularities in the patterns on the masks, and also image 3 dimensional features. The tool utilizes a large 6" (15 cm) x 8" (20 cm) field of view to image the entire photomask with a resolution of 0.18 - 0.56 microns, making it one of the most powerful and precise systems available. The asset also features automated defect review and a software suite allowing for a wide range of features for image analysis, data archiving, and reporting. NANOMETRICS NanoSpec AFT 200 utilizes a powerful image capture model to obtain bright images with high contrast and sharpness. The optics, image processing, and advanced algorithms of the equipment allow for the detection of even the smallest defects. The system also features an advanced defect recognition and classification unit, allowing for the identification of defects based on size, shape, and form. This allows for the fast assessment of defects and removes the guesswork from manual inspection. NanoSpec AFT 200 features additional functions such as automated image alignment, dust and particle removal, and image processing capabilities. All the hardware and software components of the machine are designed to provide accurate, reliable, and timely results. All these features make NANOMETRICS NanoSpec AFT 200 a powerful and precise mask and wafer inspection tool.