Used NANOMETRICS NanoSpec AFT 200 #9386650 for sale

NANOMETRICS NanoSpec AFT 200 is a mask and wafer inspection equipment that uses advanced automated techniques to completely inspect both sides of the mask and wafer surfaces, as well as the edge of the wafer. This system is designed to detect any microscopic defects that may exist in structures such as very small particles, pits, nodules, and surface voids. It utilizes a field programmable gate array (FPGA) to accurately detect and identify defects on the surface of both the wafer and mask. The first step in the process is to transfer the wafer and mask onto the AFT 200 inspection stage in the vacuum environment. This ensures that the dust and other impurities are removed from the environment and the surface of the wafer and mask. The stage includes both a high resolution imaging and a non-imaging detection unit. The imaging subsystem uses a high-resolution digital camera to capture multiple images on the mask and wafer surface. The non-imaging detection subsystem uses a laserbeam profile scanning technique to detect any defects that may exist on the mask and wafer surface. The laser beam is used to detect defect profiles using special imaging techniques, which is then processed and analyzed to identify any defects on the surface. The images captured by the AFT 200 are stored in its memory and are analyzed using proprietary image analysis techniques. The images are compared to the design file created before the inspection and any discrepancies are detected and reported. This allows the unit to detect any defects or anomalies that may exist. NanoSpec AFT 200 machine is able to perform very reliable and accurate defect inspection and can detect even subtle defects present on both sides of the mask and wafer. The tool provides users with detailed reports on any detected defects, allowing them to accurately identify and fix any issues that may exist. The asset can also be used to analyze yield data, providing valuable insights into manufacturing processes. The model is also designed to be highly user-friendly and can be easily programmed by operators to run and monitor the entire inspection process. This equipment can be used to rapidly inspect and analyze wafer and mask samples, allowing users to quickly identify and address any possible defect issues. Additionally, the system is highly flexible and can easily be integrated with other automation systems. This allows users to integrate the AFT 200 into any production environment and quickly realize its full potential. Overall, NANOMETRICS NanoSpec AFT 200 is an ideal mask and wafer inspection unit for users looking to identify and address any defect issues that may exist on the mask or wafer surfaces. Its advanced automated techniques provide accurate, reliable, and detailed reports on any detected defects, allowing users to quickly identify and resolve any issues that may exist. Furthermore, the machine's flexibility and ease of use make it a great choice for any automated inspection process.