Used NANOMETRICS NanoSpec AFT 210 VT #9226129 for sale

NANOMETRICS NanoSpec AFT 210 VT is a versatile and advanced mask and wafer inspection equipment, designed to meet today's most demanding requirements. It features a modular configuration with a high resolution, linear scan path to ensure high throughput, very low defect-detection sensitivity, and scalability across variety of applications. NanoSpec AFT 210 VT utilizes both 2D and 3D scanning techniques for mask and wafer inspections, and is capable of inspecting the finest of features and shapes up to 1 micrometer in size. It features two scanning paths, which can be operated simultaneously. The first is a slow scan path, capable of precise measurements of 3D features on both masks and wafers, with resolutions up to 0.01 micrometer. This scanning path is also capable of measuring intensity, contrast, and edge-detection. The second is a fast scan path which is perfect for measure edge position and line-width variations with resolutions up to 0.1 micrometer. NANOMETRICS NanoSpec AFT 210 VT's high resolution imaging system allows for unparalleled defect detection and measure-ment accuracy. Its lensless design helps reduce defect misdetections associated with traditional optical imaging systems. The unit is also equipped with a back-lighting machine, which enables the detection of details such as scratches, particles, and other non-visible contaminants. Additionally, the tool is also able to detect unresolved defects on print films using its optimized diffraction-enhancement technologies. The mask and wafer measurements obtained can be analyzed and compared using the sophisticated image analysis software that comes with NanoSpec AFT 210 VT. NANOMETRICS NanoSpec AFT 210 VT is compatible with industry standard image formats, allowing for compatibility with previously stored data. The asset also allows for easy integration to other data analysis software, such as statistical process control and quality control systems. Overall, NanoSpec AFT 210 VT is an incredibly versatile and powerful mask and wafer inspection model. Its modular configuration and high resolution imaging equipment provide for accurate and precise measurements of very small dimensions, even on extremely complex masks and wafers. The system also includes advanced imaging technologies, including improved diffraction-enhancement systems, which help reduce false positives and misdetections. Finally, the unit's easy integration with other data analysis software makes it a great choice for those looking to incorporate mask and wafer inspection into their workflow.