Used NANOMETRICS NanoSpec AFT 2100 #293754157 for sale

NANOMETRICS NanoSpec AFT 2100 is a highly advanced mask and wafer inspection equipment that is designed to provide ultra-precise measurements of critical feature sizes (including critical dimensions (CDs)) and architetraitures developed at leading semiconductor manufacturing facilities. This system utilizes robust software algorithms and advanced optical systems to achieve the optimal accuracy of inspection results. The integrated analysis software of the NanoSpec allows for the rapid and accurate measurement of CD and feature geometry. This unit is vital for accurately measuring device segments and ensuring that each process step is precisely monitored. The measurement accuracy is further enhanced by the powerful optical zoom lens and the automated focus control. The NanoSpec utilizes an advanced motion control machine along with a reliable, high-speed motorized stage for quick sample movements. The built-in focus control provides for autofocus as well as manual focus functionality for optimal image quality optimization of the image captured. Additionally, a software based process monitor is incorporated that allows for customizable signal processing algorithms. The scan field of NanoSpec AFT 2100 allows for quick and easy navigation of the sample surface. This tool also comes with an advanced imaging capture asset for the accurate detection and measurement of feature geometry. NANOMETRICS NanoSpec AFT 2100 is designed for automation and is capable of performing high-speed scanning and analysis. Other automated functions of this model include a specimen tracking equipment, a specimen information database, and automated reporting. The powerful and versatile software allows for the integration of custom tests and provides advanced data analysis. This allows for the detection of device issues and the traceability of CD and mask geometry. By integrating custom software tests, the system can be configured to support advanced applications such as nested geometry analysis. NanoSpec AFT 2100 provides flexibility and automation, making it an excellent choice for all mask and wafer inspection needs. With this unit, accurate measurements of CD and feature geometry can be achieved while minimizing the time and resources required for simulation, optimization, and design.