Used NANOMETRICS NanoSpec AFT 2100 #9100828 for sale

NANOMETRICS NanoSpec AFT 2100 is a powerful mask and wafer inspection system that provides superior imaging for a range of semiconductor wafer types. It is designed to meet the requirements of the most demanding semiconductor process technologies, including multi-patterning, advanced lithography and EUV-based applications. NanoSpec AFT 2100 offers unprecedented resolution and imaging fidelity, allowing industry-standard tests and inspections to be performed accurately and efficiently. The system is equipped with a dual-beam optical column, which provides simultaneous imaging of top and bottom side of the wafer, thus enabling simultaneous defect inspection. It also provides superior sensitivity for low-contrast defects and features special optics which enables the detection of defects of sub-20nm size. NANOMETRICS NanoSpec AFT 2100 is capable of acquisition and image processing of standard wafer types, such as 8", 12", and 16" wafers, as well as operation on specialized metrology wafers up to 21" in diameter. It is equipped with a number of features such as a high-speed spinning stage, auto-focus capability, and three-dimensional image profiling to improve image quality and accuracy. NanoSpec AFT 2100 is also equipped with an advanced defect analysis software suite that automates routine inspections and helps to reduce false alarm rates. The built-in defect classifying algorithms allow for analysis and classification of defects, ranking from 0 to 5. It also features an automated analysis option which can be used to quickly to pinpoint and isolate specific defect features such as contamination, pattern defects, and FIB damages. The advanced imaging features of NANOMETRICS NanoSpec AFT 2021 make it the perfect choice for semiconductor mask and wafer inspection operations. It offers superior resolution and imaging fidelity, as well as automated defect analysis and classification. It also features advanced features such as high-speed stage rotation, auto-focus capabilities, and three-dimensional image profiling to ensure superior imaging quality and accuracy.