Used NANOMETRICS NanoSpec AFT 2100 #9400848 for sale

NANOMETRICS NanoSpec AFT 2100 is a fully automated mask and wafer inspection equipment that is engineered for high-end production environments, offering a wide range of capabilities for inline defect detection and review. NanoSpec AFT 2100 provides fast, versatile feature inspection and defect detection for a variety of mask, photomask and next-generation die products. The primary system configuration includes to dedicated field systems, each consisting of an imaging turret, with both ultra-violet and type III light sources and a dedicated pixel filter module. The imaging turret is comprised of two objective lenses, assembled on a fixed articulating arm. These lenses capture light across a dual-wavelength spectrum, allowing both far and near-field inspection. The imaging turret also features a digital zoom unit that can be used to optimize the scan area, allowing quick inspection of the entire mask or wafer without the need to reposition. The separate pixel filter machine is designed to analyze the data collected by the imaging turret and compare it to pre-defined feature densities, sizes, shapes and gradients. If any feature is outside the range, an automated alert will be generated. The tool is also equipped with a number of advanced inspection capabilities, including automated feature and defect recognition, overlay imaging, and line/space identification, among many others. The asset can also be configured for multi-site capability, allowing for simultaneous inspection on multiple wafers and masks, reducing labor and increasing overall efficiency. Additionally, the model can be used for optical and darkfield microscopy, enabling the user to verify defects and inspect critical features that might not be visible under normal operation. NANOMETRICS NanoSpec AFT 2100 also provides a number of image analysis and post-processing options. Through software such as ImageJ and NIST Image Analysis Objects, users can quickly and easily create detailed post-processed images of their target die or mask. This feature set allows users to quickly diagnose and respond to potential defects, which can increase overall productivity and yield in production environments. Overall, NanoSpec AFT 2100 is an advanced mask and wafer inspection equipment that can simplify and speed up the inspection process, offering a wide range of features, high accuracy, and rapid post-processing capability. It is an ideal tool for achieving high defect yield, and improved overall production performance.