Used NANOMETRICS NanoSpec AFT 4000 #293607395 for sale
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ID: 293607395
Vintage: 1996
Film thickness measurement system
Manual load
Power supply: 115 VAC, 5 Amp, 50/60 Hz
1996 vintage.
NANOMETRICS NanoSpec AFT 4000 is a state of the art mask and wafer inspection equipment. The system has been specifically designed to provide accurate and reliable detection of etch defects, foreign particles, and process anomalies on lithographed masks and wafers. NANOMETRICS NANOSPEC / AFT 4000 utilizes advanced inspection technology to detect small defects, contaminants, and process anomalies. The unit uses multispectral imaging (MSI) technology to identify defects and process anomalies, which also enables it to detect particles and foreign materials on the masks and wafers. With its 3D inspection capabilities, the machine is also capable of detecting even sub-micron changes. NanoSpec AFT 4000 has been designed for high accuracy and repeatability. Its improved optics provide enhanced optical zoom, image detail, and sensitivity. The tool also includes a redesigned imaging-detection module that provides improved sensitivity and fast detection. Additionally, the asset utilizes automated threshold-based defect detection algorithms to ensure accuracy and repeatability. The model features various automation features, such as automated mask alignment, auto-focus, and auto-load. Its intuitive user interface allows the user to easily and conveniently access and control the equipment. NANOSPEC / AFT 4000 is designed for use with a variety of masks and wafers, including standard CMOS, DRAM, SOI, and NAND. It is also compatible with lithography steppers and scanners. In addition to its advanced inspection features, NANOMETRICS NanoSpec AFT 4000 also provides users with a variety of advanced reporting features. It includes a comprehensive report generator and a range of customizable reports. The system can also export and save data in a variety of formats, including CSV, TXT, and HTML. All in all, NANOMETRICS NANOSPEC / AFT 4000 is an advanced inspection unit, providing users with reliable, accurate, and repeatable defect and process anomaly detection. Its automated features and intuitive user interfaces make it a great choice for any mask and wafer inspection application.
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