Used NANOMETRICS NanoSpec AFT 4000 #9249318 for sale

ID: 9249318
Vintage: 1997
Film thickness measurement system 1997 vintage.
NANOMETRICS NanoSpec AFT 4000 is a robust and reliable mask and wafer inspection equipment. This advanced system is designed for high-speed, high-resolution imaging and metrology of critical lithographic features as well as for defect detection and defect analysis on masks and wafers. NANOMETRICS NANOSPEC / AFT 4000 features an ultra-high-speed backscan imaging platform, coupled with high-resolution aperture imaging that is capable of capturing images of features down to 0.25 microns at unmatched speeds. This enables fast, accurate imaging of a variety of mask and wafer formats. The unit can also detect and measure defects as small as 0.1 microns. NanoSpec AFT 4000 utilizes a variety of advanced machine components to enable fast and accurate imaging. This includes a novel automated focus control (AFC) mechanism that enables optimal focus control, providing sharp images of features and defects in all regions of the inspection field. NANOSPEC / AFT 4000 also includes an advanced phase contrast imaging (PCI) tool, which helps maximize contrast to enable precise defect detection. The asset is also equipped with a novel polarized imaging (PI) unit that is designed to quarantine and identify binary nets as well as critical features including contact-antenna structures and line-ends. NANOMETRICS NanoSpec AFT 4000 also includes a powerful imaging engine that utilizes a mix of analog and digital image processing techniques to achieve the highest possible image quality. This model also includes an advanced defect detection (DD) equipment that is designed to detect and classify small and difficult to detect defects. The system has an intuitive user interface that allows users to quickly configure parameters and configure masks and wafers for imaging. Overall, NANOMETRICS NANOSPEC / AFT 4000 is an advanced, high-performance mask and wafer inspection unit. The machine offers unmatched image quality and fast imaging speeds, coupled with robust defect detection capabilities that are suitable for a variety of applications. This tool is an ideal choice for users seeking a reliable and powerful mask and wafer inspection asset.
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