Used NANOMETRICS NanoSpec AFT 4150 #9057372 for sale

NANOMETRICS NanoSpec AFT 4150 is a sophisticated mask and wafer inspection equipment. The system is designed to deliver high-quality imaging with nanometer accuracy for semiconductor-sized features. The unit's innovations allow for sub-micron resolution for both small and large features on various mask and wafer types. The AFT 4150 employs the patented AutoFocus Technology—AFT—that significantly improves the machine's resolution and repeatability. Automatic control of the objective lens ensures that even thinner wafers remain in perfect focus throughout the entire scan. This allows for higher resolution imaging with less cycle time. Drawing from NANOMETRICS advanced lithography imaging expertise, the AFT 4150 features Perfect Scan Technology as a multi-level scanning tool. Perfect Scan Technology uses a precise multi-level scan algorithm to identify and scan features with the highest resolution—as low as 1.5nm—at every image location. The scan algorithm uses patented image processing algorithms to quickly identify the features for efficient and accurate scanning. The AFT 4150's five-axis XY-theta stage and piezo-driven scan head provide 3-D imaging and sub- micron alignment accuracy to isolate defects and detect edges with nanometer resolution. An aerial image is collected through the objective lens. This image provides the exact need needed for Defect Localization and Defect Review. NANOMETRICS NANOSPEC/AFT 4150's Isolated Wet/dry Spot inspection paves the way for better defect detection with identification of the exact signature of the defect, its precise location and its morphology. Enhanced image analysis and advanced defect detection features allow for the identification of even the smallest defects. The asset is designed for fast operation and low maintenance. NANOMETRICS patented Image Intensity Modeling technology accurately models the image intensity, which is used for automatic defect identification and classification. The AFT 4150 can be used to inspect a wide variety of mask and wafer types, including MEMS, silicon, and ceramic substrates. A broad range of common image formats can be directly handled by the model, including BMP, PPM, and TIFF. The AFT 4150 is highly scalable and can be easily upgraded to process larger areas with higher resolution. The equipment is also designed for maximum operator comfort with a height-adjustable workstation, large LCD display, and soft-touch controls. NanoSpec AFT 4150 is the perfect tool for mask and wafer inspection. Its highly advanced image analysis and automatic defect detection ensure highest-quality imaging across a range of substrates and with sub-micron accuracy. The robust system design and intuitive user interface make it an ideal choice for production labs and research facilities alike.