Used NANOMETRICS NanoSpec AFT 5100 #9266970 for sale

NANOMETRICS NanoSpec AFT 5100 Mask & Wafer Inspection Equipment is an automated, high-resolution metrology tool designed for semiconductor manufacturing. NanoSpec AFT 5100 features a general generic pattern recognition system for accurate and reliable inspection of patterns with qualitative and quantitative capabilities. It also comprises of an advanced microscope optics module, which can accurately measure multiple pattern z-height and surface parameters with the highest resolution of < 50nm. Automated metrology functions of the unit allow for high-speed and high-accuracy pattern inspection, with easy setup and simple operation. The machine offers a wide choice of imaging technologies, including brightfield, darkfield as well as polarized illumination, enabling enhanced imaging capability for a variety of cleanliness applications. It includes an optimized macro-/micro-structure illumination module for a variety of structures interface, resulting in improved image quality and fine details analysis. Additionally, the tool features a unique algorithm that intelligently detects and masks test edge details, to facilitate accurate quantification of scratches, breaks and line widths. The asset also enables precise measurement of defect sizes and locations, and advanced mask Repair, a technology for automatic defect repair. It offers multi-color overlay corrections to ensure contrast uniformity in various colored images, and 3D optical sectioning. NANOMETRICS NanoSpec AFT 5100 comes with an intuitive and user-friendly software, which lets the user easily control the model, observe test results in real-time, select, set up and optimize measurement parameters, and export data. Moreover, the equipment includes a built-in database for storing measurement data, which can be easily accessed for later use. In summary, NanoSpec AFT 5100 Mask & Wafer Inspection System is an efficient metrology tool for semiconductor manufacturing, offering a unique set of features for easy and accurate inspection of masks and wafers. It offers various imaging technologies, multi-color overlay corrections, and advanced mask repair capability for improved measurement accuracy. The unit also provides an intuitive user-friendly graphical user interface, making it easy to operate and achieve high-precision metrology results.