Used NANOMETRICS NanoSpec AFT #293661060 for sale

NANOMETRICS NanoSpec AFT is a mask and wafer inspection equipment designed for high-precision metrology applications. The system provides an extensive suite of opto-electronic components to deliver clear and detailed images of intricate mask and wafer features. It integrates two basic components to achieve this: a laser-source imaging unit and an advanced imaging head. The laser-source component of NANOMETRICS NANOSPEC/AFT measures feature dimensions with sub-nanometer (~1 nm) accuracy. It uses an 8-channel laser machine combined with three-channel intensified CCD (ICCD) cameras. This tool is capable of advanced 3D imaging and can be specifically configured for error correction and/or measurement applications. It also supports a wide range of pattern recognition techniques and provides precise, accurate, and high-resolution imaging of both mask and wafer features. The imaging head component of NanoSpec AFT provides high-precision imaging of wafer surfaces and features with a resolution of 0.5 nm. It includes a high-reflection multi-axis high precision motorized stage. This module enables incredibly precise control of the stage for optimal alignment of the imaging asset to the wafer surface. This model also provides a robust optical isolation equipment to eliminate interference from ambient light sources and ensure high-resolution imaging. NANOSPEC/AFT is the most comprehensive and cost-effective solution available for high-precision mask and wafer inspection. It allows precise measurement of feature dimensions and error correction of patterns including line-widths and corner-cuts. As such, it provides an invaluable tool for process control and manufacturing optimization. The system is highly reliable and easy to operate, making it ideal for the production environment.