Used NANOMETRICS Nanospec ATF210 #9170904 for sale

NANOMETRICS Nanospec ATF210 is a next-generation mask and wafer inspection system specifically designed for high-performance semiconductor fabrication. Specifically, the ATF210 is built on a scanning electron microscope (SEM), which enables highly detailed imaging. This information gives semiconductor manufacturers the data needed to determine manufacturing issues or process-related defects during the fabrication process. The ATF210 is equipped with a unique variable pressure stage, which has the ability to reduce the scan-to-wafer distance, thus allowing minimal electron beam distortion. This variable pressure stage technology is not featured in other non-NANOMETRICS mask and wafer inspection systems. The specialized variable pressure stage also provides the highest possible image clarity and size accuracy. Nanospec ATF210 is capable of a wide range of imaging techniques which allow for an accurate and detailed view of the layout patterns, micromasks, and photomasks. Moreover, the ATF210 is able to differentiate between various material layers within wafer stacks; this invaluable capability closely supports the development and optimization of semiconductor device layers during manufacturing. NANOMETRICS Nanospec ATF210 also boasts the industry's highest resolution imaging. The high magnification settings supported by the SEM allow the ATF210 to capture images with unprecedented levels of detail. The increased resolution of the images allows for the specimen's finest features to be captured without distorting the structure of the specimen itself. Nanospec ATF210 is designed to be as user-friendly as possible. It has an intuitive graphical user interface, allowing the user to quickly familiarize themselves with the systems functions and features. Additionally, the ATF210 is equipped with an auto-focus feature, which helps reduce the amount of time needed set up and prepare the microscope. NANOMETRICS Nanospec ATF210 is also compliant with high volume production requirements due to its robustness and speed. Overall, Nanospec ATF210 is an excellent mask and wafer inspection system for any semiconductor fabrication environment. Its robust feature set and optimized scanning capabilities are designed to provide reliable and accurate imaging of the most complex layout patterns, micromasks, and photomasks. Furthermore, NANOMETRICS Nanospec ATF210 has an intuitive user interface that makes it user-friendly and the highest resolution imaging capabilities give the system the versatility needed to ensure an optimal fabrication process.