Used NANOMETRICS NanoSpec II #9265792 for sale

NANOMETRICS NanoSpec II is a cutting-edge mask & wafer inspection equipment that helps to increase productivity and reduce costs associated with wafer manufacturing and fabrication. This system uses an advanced optical microscope, precise motorized stages, and sophisticated software to enable operators to check and identify defects in both photomasks and wafers. NanoSpec II utilizes a powerful two-pass optical unit that provides high resolution images. It combines high numerical aperture (NA) objectives and sophisticated image acquisition software to capture and analyze the features of both photomasks and wafers. The design of the optical objectives and apertures has an optimal point of view for a wide range of die sizes and numerous topography conditions. A wide range of objectives with high NA, from 50x to 100x, is also available. In addition to the optical components, NANOMETRICS NanoSpec II also comes equipped with a high-precision motorized x-y stage. This allows the operator to move the specimen easily and quickly so that the entire wafer can be inspected rapidly. The rigid structure of the stages also ensures smooth and stable motion, even during long hours of operation. NanoSpec II is also designed to be highly intuitive and user-friendly and includes a variety of features to simplify operation. There is an LED display that clearly shows information such as the current magnification and exposure time, as well as buttons that allow the user to set up the test parameters. The software also allows users to save inspection results and results analysis, allowing for a more accurate assessment of defects. In addition, this machine also features automated wafer quality control functions that help to rapidly detect any defect or contamination on the wafers. This automated defect detection tool can detect both high and low voltage anomalies, particle defects, sub-micron defects, and residues. This makes the asset extremely effective at finding the source of production defects faster and more accurately than manual inspection. NANOMETRICS NanoSpec II is the perfect solution for rapidly and accurately inspecting photomasks and wafers. The powerful optics, motorized stages, and user-friendly software makes it an ideal choice for production environments that demand the highest level of accuracy and reliability.