Used NANOMETRICS NanoSpec M-5100UV / M-5100 #9211233 for sale

NANOMETRICS NanoSpec M-5100UV / M-5100 is a versatile multi-sensor mask and wafer inspection equipment that is designed to give users efficient results with unbeatable accuracy. It provides the highest spatial resolution and the most precise feature analysis available in the industry. The system combines feature measurements, CD metrology, and low noise images into a single, user-friendly instrument. NanoSpec M-5100UV / M-5100 includes four distinct laser-based scanners, which are highly efficient and customizable for use in a wide variety of mask and wafer inspection applications. These four scanning devices are the Nanofocus X-ray, the Mask-to-Wafer Unit, the Overlay/Flatness Machine, and the Reticle Defect Tool. The Nanofocus X-ray scanner provides images down to 15nm with its high resolution imaging asset. This model allows for automated feature recognition and matching, allowing it to be very efficient in identifying and characterizing features. The Mask-to-Wafer Equipment is capable of quickly comparing the CD/SD profile of each mask and wafer, and then accurately evaluating the differences between the two. It can also perform mask and wafer inspections in real-time. This allows for quick and efficient mask and wafer comparisons. The Overlay/Flatness System is designed to expedite the inspections of masks and wafers with flatness and overlay accuracy. The unit measures the differences between the two for different features and sizes. This eliminates the need for tedious manual measurements. The Reticle Defect Machine consists of a pattern recognition algorithm that is highly accurate in detecting and identifying defects on the reticles. It also can autosave the detected defects, allowing users to save time and resources when inspecting reticles. Overall, NANOMETRICS NanoSpec M-5100UV / M-5100 is a highly efficient and accurate tool that can help users quickly and accurately identify and characterize features on masks and wafers. Its four scanning devices provide the highest spatial resolution with precise feature analysis, making it the ideal choice for efficient mask and wafer inspection.