Used NANOMETRICS Q7 #9078034 for sale

NANOMETRICS Q7 is a comprehensive mask and wafer inspection equipment and is an industry leader in nondestructive defect detection. The system is capable of detecting microscopic defects in advanced semiconductor materials, such as photomasks, wafers, and reticles. Using advanced algorithms, the unit processes and analyzes data from multiple imaging techniques, such as laser brightfield imaging, stylus, X-ray and optical imaging. The innovative and reliable Q7 machine offers exceptional accuracy and high-resolution imaging with a built-in particle counter for particle contamination measurement. The tool also features a 3.5" touch-screen display, easy setup and intuitive user interface. Furthermore, the asset is equipped with an autonomous defect classification model to automatically detect and classify the most complex particles and defects. NANOMETRICS Q7 equipment also utilizes nanofocus technology, the most advanced imaging feature in the marketplace. NanoFocus's imaging capabilities include auto-focussing, high magnification, low aberration, and low-noise characteristics, which result in more accurate detections and higher production yields. Q7 provides results that can be used for detailed defect source location and characterization. Reports can also be customized and tailored to meet specific customer needs. The system is designed to maximize quality assurance, process efficiency, and cost savings. It is also certified to meet several international and national standards such as ISO 9001 and ISO 13485. Overall, NANOMETRICS Q7 is a comprehensive mask and wafer inspection unit with advanced imaging capabilities, high-precision particle counting, and defect location and analysis. The machine is designed to meet the highest standards in semiconductor manufacturing. The ease-of-use, high-performance, and robust hardware/software make Q7 an ideal tool for inspection of most kind of semiconductor devices.