Used NANOMETRICS Spark-300 #9352204 for sale

NANOMETRICS Spark-300 is a "mask & wafer inspection" equipment, featuring high-resolution metrology technology that guarantees outstanding operating accuracy and quality in modern semiconductor production processes. This system is specifically designed to facilitate automated measurement tasks structures on printed circuit boards, semiconductor wafers and other small components. Spark-300 offers a variety of automated scanning technologies and features that make the unit ideal for precise metrology analysis. The machine includes a quartz lens with a large field of view, high-sensitivity photoelectric sensors, dedicated software and feature recognition algorithms. The integrated laser detector and a variety of optics configurations help to ensure accurate and precise analysis of the inspected components. The tool also features a newly designed Illumination Delivery Asset, offering absolute flexibility in terms of illumination and an adjustable pattern size in the range of 8x8 to 150x150 mm. This allows the user to switch between different illumination sources, making it possible to analyze larger components. NANOMETRICS Spark-300 model offers several analytical functions, including the determining of working parameters (e.g. layer thickness, circuit pattern shape, size, etc.), digital image comparison, rework analysis and much more. The equipment operates on a user-friendly, interactive graphical user interface (GUI). The GUI allows users to view monochromatic and binary images, measure layer thickness and analyze parameters in real-time. The graphical user interface also allows for easy and efficient data retrieval and analysis. An optional inspection kit is available that further increases the performance of the system. The kit includes a sample target board and test specimens as well as a data processing analysis application for more in-depth testing and analysis. In summary, Spark-300 mask and wafer inspection unit offers superior precision and accuracy for automated metrology analysis in modern semiconductor production processes. The machine is powered by the latest scanning and inspection technology, with innovative illumination and optics configurations for enhanced performance. The tool is easy to use and cost-effective, making it an ideal choice for automated inspection and analysis tasks.