Used NANOMETRICS Vertex #9379059 for sale

NANOMETRICS Vertex is a mask and wafer inspection system designed to support advanced process nodes and applications including the finFET technology. It is equipped with advanced image operations and advanced pattern recognition capabilities. The system can be used to improve critical defect detection in wafer lithography processes for both active and passive layers. It consists of a unique image acquisition engine that can acquire top and bottom images with total brightness uniformity and sharpness, combined with a high-performance optical module that provides uniform illumination and excellent image quality. Vertex can also be configured with several advanced image operation capabilities, one of which is a patented Image Intersection Technique (IIT) that enables detection of conformal anti-reflective coating (CARC) as well as sub-resolution features like micro-bridges and defect puddles. It also comes with an Analytical Matching Module (AMM), which is a computer-aided process for defect identification and classification. The system has also been designed with a high-speed data storage capacity, on-board multiple-stage defect identification engine for greater efficiency and accuracy, and features to enable automatic defect review and annotation. In addition, it can be configured with data acquisition and analysis engines for failure analysis, drop-down menu for easy operation and setup, and different camera head modules for various applications. Finally, NANOMETRICS Vertex can be integrated with a wide range of automation solutions for automated defect review and annotation, defect tracking and trend analysis. It also supports automated defect sort and sequencing for a variety of wafer layers and metrology operations.